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r1 - 25 Jan 2008 - 12:11:00 - RossRobinsonYou are here: TWiki >  Sandbox Web  >  TWikiUsers > RossRobinson > RossRobinsonSandbox
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Processing Germanium

Etch Germanium

  • Semiconductor Materials By Lev Isaakovich Berger (google book search),
Does not react with HCl nor dilute H2SO4. HNO3 and Agua Rega do etch GE. 3% H2O2 will dissolve Ge and precipitates GeO2?

So I think that I will do a rinse in HCl to get metals off, then a minute or two in NH3OH : H2O2 to get a fresh surface.

-- RossRobinson - 25 Jan 2008

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